Applied Physics Internship: Data Analysis and Tool Building for SEM Imaging

Job description

Introduction The Wafer Metrology group is part of ASML’s Development & Engineering organization, within the Performance & Integration cluster. The group is responsible for developing a robust metrology ecosystem that enables accurate performance assessment and optimization of ASML’s lithography systems. This ecosystem includes state-of-the-art hardware platforms—such as Critical Dimension Scanning Electron Microscopes (CD-SEM) and optical metrology tools—as well as advanced software solutions for image processing, contour extraction, and KPI evaluation. CD-SEM is a cornerstone technology in semiconductor manufacturing and is widely used across both Research & Development (R&D) and High Volume Manufacturing (HVM) to monitor lithographic fidelity, process stability, and yield-critical phenomena such as defects. Your assignment: We are offering three internship assignments, each focusing on a key challenge in SEM imaging. Defects in CD-SEM images can significantly impact metrology accuracy and process performance. At the same time, they provide valuable insight into process behavior. In this internship, you will develop scalable algorithms to detect and classify defects in large SEM d...